Most cited publications in LEAST:
Citations according to Google Scholar- 29 July 2014
S. Das and J. Appenzeller, "Where Does the Current Flow in Two-Dimensional Layered Systems," Nano Lett., vol. 13, pp. 3396–3402, 2013. Times Cited 14
C. Gong, H. Zhang, W. Wang, L. Colombo, R.M. Wallace, and K.Cho, "Band Alignment of Two-Dimensional Transitional Metal Dichalcogenides: Application in Tunnel Field Effect Transistors,"Appl. Phys. Lett. vol. 103, 050315, 2013. Times Cited 12
C. Gong, C. Huang, J. Miller, L. Cheng, Y. Hao, D. Cobden, J. Kim, R. Ruoff, R.M. Wallace, K.J. Cho, Z. Xu, and Y. Chabal, "Metal Contacts on Physical Vapor Deposited Monolayer MoS2," ACS Nano vol. 7 Issue 12, pp. 11350-11357, Nov. 2013. Times Cited 10
S. McDonnell, R. Addou, C. Buie, R.M. Wallace, and C.Hinkle,"Defect-Dominated Doping and Contact Resistance in MoS2," ACS Nano vol. 8 Issue 3, pp. 2880-2888, Jan. 2014. Times Cited 7
C. Gong, L. Colombo, R. M. Wallace, K. J. Cho, "The Unusual Mechanism of Partial Fermi Level Pinning at Metal-MoS2 Interfaces," Nano Lett., 14(4), 1714-1720 2014 Times Cited: 6
N. Ma and D. Jena, "Interband Tunneling in Two-Dimensional Crystal Semiconductors," Appl. Phys. Lett., vol. 102, 132102, 2013. Times Cited 6
K. Swaminathan, E. Kultursay, V. Saripallu, V. Narayanan, M. Kandemir, S. Datta, "Steep Slope Devices: From Dark to Dim Silicon," IEEE Micro 33 2013 Times Cited: 6
C. Battaglia, X.Yin, M. Zheng, I.D. Sharp, T. Chen, S. McDonnell, A. Azcatl, C. Carraro, B. Ma, R. Maboudian, R.M. Wallace, and A. Javey, "Hole Selective MoOx Contact for Silicon Solar Cells," Nano Lett., vol. 14, pp 967-971, 2014. Times Cited 6
S. Chuang,R. Kapadia, C. Battaglia, A. Azcatl, S. McDonnell, J.S.Kang, X.Yin, M.Tosun, R. M. Wallace, A. Javey, "MoS2 P-type Transistors and Diodes Enabled by High Workfunction MoOx Contacts," Nano Lett., vol. 14 pp 1337-1342 2014 Times Cited: 6
J. Lyons, A. Janotti, C. Van de Walle, "Effects of Carbon on the Electrical and Optical Properties of InN, GaN and AIN," Physical Review B, vol. 89,035201, Jan 2014. Times Cited 4
B. Chakrabarti, R. Galatage, E. M. Vogel, "Multilevel Switching in Forming-free Resistive Memory Devices with Atomic Layer Deposited HfTiO(x) Nanolaminate," Electron Device Letters, 34(7), 1714-1720 2013 Times Cited: 4
C. Van de Walle, M. Choi, J. Weber, J. Lyons and A. Janotti, "Defects at Ge/oxide and III-V/Oxide Interfaces," Microelectronic Engineering, vol. 109, pp. 211-215, Sept. 2013. Times Cited 3
S. McDonnell, B. Brennan, A. Azcatl, N. Lu, H. Dong, C. Buie, J. Kim, C. Hinkle, M. Kim, and R.M. Wallace,"HFO2 on MoS2 by Atomic Layer Deposition: Adsorption Mechanisms and Thickness Scalability," ACS Nano vol. 7 issue 11 pp. 10354-10361, Oct. 2013. Times Cited 3
N. Ma and D. Jena, "Charge Scattering and Mobility in Atomically Thin Semiconductors," Physical Review X vol. 4, 011043, March 2014. Times Cited 2
J.H. Park, A. Kummel, J. Royer, E. Chagarov, T. Kaufman-Osborn, M. Edmonds, T. Kent, S. Lee, W. Trogler, "Atomic Imaging of the Irreversible Sensing Mechanism of NO(2) Adsorption on Copper Phthalocyanine," Journal of the American Chemical Society, vol. 135, 39, pp. 14600-14609, Aug. 2013. Times Cited 2
S. Raghavan, S. J. Allen, and S. Stemmer, "Subband structure of two-dimensional electron gases in SrTiO3, " Appl. Phys. Lett., vol. 103, 212103 2013. Times Cited 1
Selected other publications from the LEAST research team:
D. Jena, "Tunneling Transistors Based on Graphene and 2-D Crystals," IEEE Proc., vol. 101, pp. 1585-1602, 2013.
P. Zhao, R. Feenstra, G. Gu, and D. Jena, "SymFET: A Proposed Symmetric Graphene Tunneling Field-Effect Transistor," IEEE Trans. Electron Devices, vol. 60, pp. 951-957, 2013.
M. Choi, J. Lyons, A. Janotti and C. Van de Walle, “Impact of carbon and nitrogen impurities in high-k dielectrics on metal-oxide-semiconductor-based devices,” Appl. Phys. Lett. 102, 142902, 2013.
M. Choi, A. Janotti and C. Van de Walle, “Native point defects in LaAlO3: A hybrid functional study,” Phys. Rev. B 88, 214117, 2013.
L. Bjaalie, B. Himmetoglu, L. Weston, A. Janotti and C. G. Van de Walle, “Oxide interfaces for novel electronic applications,” New J. Phys. 16, 025005, 2014.